The 1st USTC-FHI workshop on the Frontiers of Advanced Electronic Structure Methods
Hefei, June 14-18, 2016



Application for Participation

The deadline to apply for participation is April 31st, 2016.

Registration fee:

  • 1500 RMB, for participants within China
  • 250 USD, for participants from abroad

The registration fee covers five days' lunch and dinner at the workshop, but not the accommodation cost.

Participants are invited to present their research work in poster sessions.
Registration is required for all attendees. You need the email address which you used during the registration application in order to submit your abstract. If you did not yet fill in the Application form, please do so before you try uploading your abstract.